Vacuum coating

Posted by: CCHEN JIANG 2020-05-25 Leave a comment

A technology that produces thin film materials. The atoms of the material in the vacuum chamber are separated from the heating source and hit the surface of the object to be plated. This technology is used for the production of aluminum coatings on laser discs (CDs) and metal coatings on printed circuit boards by masks.
Preparation of the film layer in vacuum, including plating crystalline metal, semiconductor, insulator and other elemental or compound films. Although chemical vapor deposition also uses vacuum methods such as decompression, low pressure, or plasma, vacuum coating generally refers to the physical deposition of thin films. There are three forms of vacuum coating, namely evaporation coating, sputter coating and ion plating.
Evaporation coating: evaporation of a substance by heating it to deposit on a solid surface, called evaporation coating. This method was first proposed by M. Faraday in 1857, and modernization has become one of the commonly used coating technologies.
Sputter coating: When bombarding the solid surface with high-energy particles, the particles on the solid surface can gain energy and escape from the surface and be deposited on the substrate. Sputtering phenomenon began to be used in coating technology in 1870, and it was gradually used in industrial production after 1930 due to increased deposition rate.
Ion plating: The molecules of the evaporated substance are ionized by electron impact and deposited on the solid surface as ions, called ion plating. This technique was proposed by D. Metox in 1963. Ion plating is a combination of vacuum evaporation and cathode sputtering technology.


您的电子邮箱地址不会被公开。 必填项已用*标注